ABSTRACT

Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs,
this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay

chapter 1|12 pages

Silicon Semiconductor Metrology

chapter 4|29 pages

MOS Device Characterization

chapter 17|54 pages

Metrology of Image Placement