ABSTRACT

Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,

chapter 1|4 pages

Introduction

chapter 3|14 pages

Macroscopic Plasma Characteristics

chapter 8|24 pages

Numerical Procedure of Modeling

chapter 9|20 pages

Capacitively Coupled Plasma

chapter 10|14 pages

Inductively Coupled Plasma

chapter 11|12 pages

Magnetically Enhanced Plasma

chapter 12|30 pages

Plasma Processing and Related Topics